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前言: 2025年, IC製程已可試量產2nm(奈米)!IC晶片電路製作方法，主要是微影製程，2024年, IC製程已可量產3nm(奈米)!時序進入2025年, IC製程已可試量產2nm(奈米)!奈米壓印微影(NIL, Nano-imprint lithography process)製程是Canon最近幾年提出的，2023年Canon宣稱可以做到7nm(奈米)，2024年Canon又宣稱可以做到5 nm(奈米)!因此，本書將介紹7奈米IC晶片電路製作方法--形成半絕對尺寸硬罩幕的方法(ROC patent, 140552, 8/21/2001):半導體微影製程: 硬罩幕方法!實施多次硬罩幕方法，可以提高多倍的解析度!但是良率(yield rate)也會降低很多!這就是使用193奈米曝光機，作7奈米不如EUV的結果!
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de Kung Linliu ...

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The two volumes of Handbook of Gas Sensor Materials provide a detailed and comprehensive account of materials for gas sensors, including the properties and relative advantages of various materials. Since these sensors can be applied for the automation of myriad industrial processes, as well as for everyday monitoring of such activities as public safety, engine performance, medical therapeutics,
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